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Ozone supply

Ozone supply for EB systems

Function and Features

• The particles is not generated. 

• The high concentration ozone gas can be generated without nitrogen.

• Ozone gas of the very small quantity can be introduced into a vacuum chamber.

• For ozone cleaning is not necessary to stop the equipment during normal operation.

• This ozone supply is low noise. It can be installed in the vicinity of the EB equipment.

 

オゾンガス供給機

Ozone supply

Specification

Ozone concentration: 200g/m3
Ozone generation system: Silent discharge method
Supply Ozone rate: maximum 5.0sccm
Raw material gas: Cylinder oxygen、PSA oxygen
Raw material gas consumption: 50ml/min
Cooling method: Water-cooling

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Ozone cleaning technology.

This technology can be used to SEM, EB exposure system and EB inspection system.

The high concentration ozone gas can be react with electron beam irradiation and decomposes contamination.

Ozone gas can reduce contamination and it is effective in the removal of the grown contamination.

 

EB irradiation to Mo aperture (Φ100μm)

オゾンクリーニング無

Without ozone cleaning

オゾンクリーニング有

With ozone cleaning

Ozone cleaning system diagram

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Mechanism of ozone cleaning

With the cycle of ① ~ ④ . Ozone cleaning continue to remove contamination in vacuum.

201631131038.jpg

Electron beam are irradiated to the ozone molecules adsorbed on the surface of the object.

20163113118.jpg

Oxygen radical occurs molecule is decomposed by the electron irradiation energy.

オゾンクリーニングのメカニズム03

Oxygen radicals remove the contamination to react with the carbon and hydrogen in the contamination.

オゾンクリーニングのメカニズム04

④New ozone molecules are adsorbed.

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Contact

PARAM Corporation

 Excel Bldg., 3F. 4-44-4 Dai-machi, Hachioji-shi, Tokyo 193-0931 Japan

【Phone】  (+81) 42-629-9852
【Fax】  (+81) 42-629-9862

 

Mail

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