PARAM Corporation｜Tokyo Hachioji city｜Ultra-high-speed electron beam lithography technology・Microfabrication technology

Ozone supply

Ozone prevents hydrocarbon contamination deposited and keeps clean surface on inner tube of electron beam column while the drawing and observation. This technology can be adopted to an electron beam lithography system, inspection and· SEM equipment.
Ozone decomposer

It decomposes the ozone to harmless oxygen gas. Ozone concentration is 0.1ppm or less at exit.
Electron beam column

Design, manufacturing and testing of an electron beam column according to order of guests. We are very familiar to various type of EB column and have excellent technology on them from the large current beam column to high resolution column. We can satisfy the various order of guests of the difficult EB column.
Electron beam column control circuits

Electron beam column control circuits according to order of guests. We are very familiar with the design and manufacturing operations of the scanning, the position detection, the stabilization and the various control circuit technology of electron beam. We are also familiar with the control software development technology.

Multi-beam multi-column system

Multi-column is a bundle of more than 100 small columns using a permanent magnet. In a single column more than 1600 beams which size are 5nm or less are arranged in a square lattice. Each beam can flash independently.
High brightness electron emitter

Low work function electron emitter. A work function of 1.8 eV to 2.1 eV is realized. High luminance or high lifetime can be obtained with low work function.
Small lens with permanent magnet

Small lens using a permanent magnet as the main magnetic field. To suppress the column diameter to smaller than 20mm to 15mm. Up to 170 columns are can be arranged on a 300mm wafer. To correct the magnetic field strength the correction coils are used.